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Principles of Dielectric Chemical Mechanical Planarization : TRIBOLOGICAL, THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLANARIZATION PROCESSES - Jamshid Sorooshian
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Principles of Dielectric Chemical Mechanical Planarization : TRIBOLOGICAL, THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLANARIZATION PROCESSES - Taschenbuch

2009, ISBN: 3639176812

[EAN: 9783639176810], Neubuch, [PU: VDM Verlag Dr. Müller], nach der Bestellung gedruckt Neuware - Printed after ordering - Chemical Mechanical Planarization (CMP) processes in semiconduc… Mehr…

NEW BOOK. Versandkosten:Versandkostenfrei. (EUR 0.00) AHA-BUCH GmbH, Einbeck, Germany [51283250] [Rating: 5 (von 5)]
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Principles of Dielectric Chemical Mechanical Planarization : TRIBOLOGICAL, THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLANARIZATION PROCESSES - Jamshid Sorooshian
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Jamshid Sorooshian:

Principles of Dielectric Chemical Mechanical Planarization : TRIBOLOGICAL, THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLANARIZATION PROCESSES - Taschenbuch

2009, ISBN: 3639176812

[EAN: 9783639176810], Neubuch, [PU: VDM Verlag Dr. Müller], nach der Bestellung gedruckt Neuware -Chemical Mechanical Planarization (CMP) processes in semiconductor manufacturing are deve… Mehr…

NEW BOOK. Versandkosten:Versandkostenfrei. (EUR 0.00) AHA-BUCH GmbH, Einbeck, Germany [51283250] [Rating: 5 (von 5)]
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Principles of Dielectric Chemical Mechanical Planarization - Sorooshian, Jamshid
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Sorooshian, Jamshid:
Principles of Dielectric Chemical Mechanical Planarization - Taschenbuch

2009

ISBN: 9783639176810

[ED: Softcover], [PU: VDM Verlag Dr. Müller], Chemical Mechanical Planarization (CMP) processes in semiconductor manufacturing are developed based on the quality, efficiency and cost of t… Mehr…

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Principles of Dielectric Chemical Mechanical Planarization - Jamshid Sorooshian
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Jamshid Sorooshian:
Principles of Dielectric Chemical Mechanical Planarization - Taschenbuch

ISBN: 9783639176810

*Principles of Dielectric Chemical Mechanical Planarization* - TRIBOLOGICAL THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLANARIZATION PROCESSES / T… Mehr…

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Principles of Dielectric Chemical Mechanical Planarization - Jamshid Sorooshian
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Jamshid Sorooshian:
Principles of Dielectric Chemical Mechanical Planarization - Taschenbuch

ISBN: 3639176812

Principles of Dielectric Chemical Mechanical Planarization ab 78.99 € als Taschenbuch: TRIBOLOGICAL THERMAL AND KINETIC CHARACTERIZATION OF DIELECTRIC AND Tungsten CHEMICAL MECHANICAL PLA… Mehr…

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Details zum Buch
Principles of Dielectric Chemical Mechanical Planarization

Chemical Mechanical Planarization (CMP) processes in semiconductor manufacturing are developed based on the quality, efficiency and cost of the proposed process. CMP applications in semiconductor manufacturing are highly dependent on consumables (i.e., polishing slurries, pads and diamond discs) quality. Coupling this with the pace of technology turn over as defined by Moore's Law, material characterization and process impacts are critical in providing manufacturer's with the greatest level of studied and known effects to an existing process in order to improve the efficiency of the path finding and development stages of process creation. This thesis presents a series of studies based on oxide and tungsten planarization processes geared towards achieving the aforementioned goals. The capstone of this work is a novel and most accurate model of material removal rate based on a kinetic Langmuir-Hinshelwood removal rate model. The series of studies shown in this work also focus on the parametric characterization of variations to the CMP process as would be seen from a thermal, kinetic and tribological aspects of the process.

Detailangaben zum Buch - Principles of Dielectric Chemical Mechanical Planarization


EAN (ISBN-13): 9783639176810
ISBN (ISBN-10): 3639176812
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2009
Herausgeber: VDM Verlag Dr. Müller

Buch in der Datenbank seit 2009-12-19T15:15:36+01:00 (Zurich)
Detailseite zuletzt geändert am 2024-01-23T04:12:15+01:00 (Zurich)
ISBN/EAN: 3639176812

ISBN - alternative Schreibweisen:
3-639-17681-2, 978-3-639-17681-0
Alternative Schreibweisen und verwandte Suchbegriffe:
Titel des Buches: chemical process principles, kinetic


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