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Tantalum Oxide Thin Films for Embedded Capacitors - Jain Pushkar
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2008, ISBN: 9783639096620

ID: 111563670

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Using Pulsed DC Reactive Sputtering Bücher > Sachbücher > Naturwissenschaften & Technik > Ingenieurwissenschaft & Technik Taschenbuch 01.10.2008 Buch (fremdspr.), VDM, .200

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Tantalum Oxide Thin Films for Embedded Capacitors - Using Pulsed DC Reactive Sputtering
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Tantalum Oxide Thin Films for Embedded Capacitors - Using Pulsed DC Reactive Sputtering - Taschenbuch

2008, ISBN: 9783639096620

[ED: Taschenbuch / Paperback], [PU: VDM Verlag Dr. Müller], Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed., [SC: 0.00], Neuware, gewerbliches Angebot, [GW: 288g]

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Tantalum Oxide Thin Films for Embedded Capacitors - Jain Pushkar
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Using Pulsed DC Reactive Sputtering Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Bücher / Sachbücher / Naturwissenschaften & Technik / Ingenieurwissenschaft & Technik 978-3-639-09662-0, VDM

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Tantalum Oxide Thin Films for Embedded Capacitors - Jain Pushkar
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Tantalum Oxide Thin Films for Embedded Capacitors - neues Buch

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ID: 106260512

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Using Pulsed DC Reactive Sputtering Buch (dtsch.) Bücher>Sachbücher>Naturwissenschaften & Technik>Ingenieurwissenschaft & Technik, VDM

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Tantalum Oxide Thin Films for Embedded Capacitors - Pushkar Jain
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Embedded capacitor technology, where thin film, [PU: VDM Verlag Dr. Müller, Saarbrücken]

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Tantalum Oxide Thin Films for Embedded Capacitors
Autor:

JAIN PUSHKAR

Titel:

Tantalum Oxide Thin Films for Embedded Capacitors

ISBN-Nummer:

9783639096620

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed.

Detailangaben zum Buch - Tantalum Oxide Thin Films for Embedded Capacitors


EAN (ISBN-13): 9783639096620
ISBN (ISBN-10): 3639096622
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2008
Herausgeber: VDM Verlag
212 Seiten
Gewicht: 0,332 kg
Sprache: ger/Deutsch

Buch in der Datenbank seit 04.04.2007 23:25:23
Buch zuletzt gefunden am 18.01.2017 18:26:01
ISBN/EAN: 9783639096620

ISBN - alternative Schreibweisen:
3-639-09662-2, 978-3-639-09662-0

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