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Tantalum Oxide Thin Films for Embedded Capacitors - Jain Pushkar
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Tantalum Oxide Thin Films for Embedded Capacitors - neues Buch

2008, ISBN: 9783639096620

ID: 573740331

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Using Pulsed DC Reactive Sputtering Bücher > Sachbücher > Naturwissenschaften & Technik > Ingenieurwissenschaft & Technik Taschenbuch 01.10.2008 Buch (fremdspr.), VDM, .200

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Tantalum Oxide Thin Films for Embedded Capacitors - JAIN PUSHKAR
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JAIN PUSHKAR:
Tantalum Oxide Thin Films for Embedded Capacitors - Taschenbuch

2008, ISBN: 3639096622

ID: 20006533819

[EAN: 9783639096620], Neubuch, [PU: VDM Verlag Okt 2008], Technology|Engineering|Chemical & Biochemical, Neuware - Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. 212 pp. Deutsch

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Tantalum Oxide Thin Films for Embedded Capacitors - JAIN PUSHKAR
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JAIN PUSHKAR:
Tantalum Oxide Thin Films for Embedded Capacitors - Taschenbuch

2008, ISBN: 3639096622

ID: 20006515843

[EAN: 9783639096620], Neubuch, [PU: VDM Verlag Okt 2008], Technology|Engineering|Chemical & Biochemical, Neuware - Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. 212 pp. Deutsch

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Tantalum Oxide Thin Films for Embedded Capacitors - Pushkar Jain
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ISBN: 9783639096620

ID: fff48127fa711048cf1500b83d7edbc4

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed. Bücher / Naturwissenschaften, Medizin, Informatik & Technik / Technik, [PU: VDM Verlag Dr. Müller, Saarbrücken]

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Tantalum Oxide Thin Films for Embedded Capacitors: Using Pulsed DC Reactive Sputtering - JAIN PUSHKAR
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Tantalum Oxide Thin Films for Embedded Capacitors: Using Pulsed DC Reactive Sputtering - Taschenbuch

ISBN: 3639096622

Taschenbuch, [EAN: 9783639096620], Vdm Verlag, Vdm Verlag, Book, [PU: Vdm Verlag], Vdm Verlag, 404338, Allgemein, 404336, Biochemie, 290517, Biowissenschaften, 288100, Fachbücher, 541686, Kategorien, 186606, Bücher, 290873, Chemie, 560074, Kunststofftechnik, 290520, Ingenieurwissenschaften, 288100, Fachbücher, 541686, Kategorien, 186606, Bücher

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Details zum Buch
Tantalum Oxide Thin Films for Embedded Capacitors
Autor:

JAIN PUSHKAR

Titel:

Tantalum Oxide Thin Films for Embedded Capacitors

ISBN-Nummer:

Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this work focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors for IC chips and packages. A design space for breakdown voltage and capacitance density of planar capacitors is established, with film thickness and material dielectric constant as parameters. The validity of the developed design space is experimentally verified with Ta2O5 thin films over a wide range of film thickness. An experimentally verified analytical model for pulsed dc reactive sputtering of Ta2O5 films is described and evaluated. Various processing and integration challenges in depositing thin films using reactive sputtering and their effects on electrical performance of thin-film capacitors are discussed.

Detailangaben zum Buch - Tantalum Oxide Thin Films for Embedded Capacitors


EAN (ISBN-13): 9783639096620
ISBN (ISBN-10): 3639096622
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2008
Herausgeber: VDM Verlag
212 Seiten
Gewicht: 0,332 kg
Sprache: ger/Deutsch

Buch in der Datenbank seit 04.04.2007 23:25:23
Buch zuletzt gefunden am 06.05.2017 18:26:07
ISBN/EAN: 9783639096620

ISBN - alternative Schreibweisen:
3-639-09662-2, 978-3-639-09662-0


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